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Erhu Zheng
at Semiconductor Manufacturing International Corp
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Publications (1)
Proceedings Article | 21 March 2017 Paper
The line roughness improvement with plasma coating and cure treatment for 193nm lithography and beyond
Erhu Zheng, Yi Huang, Haiyang Zhang
Proceedings Volume 10149, 101490Y (2017) https://doi.org/10.1117/12.2257395
KEYWORDS: Plasma, Coating, Line edge roughness, Line width roughness, 193nm lithography, Optical lithography, Plasma etching, Etching, Process modeling, Plasma treatment, Vacuum ultraviolet, Argon
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