Dr. Gert Leusink
VP Technology at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 April 2018 Paper
Richard Farrell, Elliott Franke, Kanda Tapily, Jodi Hotalen, David O'Meara, Angelique Raley, Akitero Ko, Peter Biolsi, Cory Wajda, Gert Leusink, Anton DeVilliers, David Hetzer
Proceedings Volume 10586, 1058611 (2018) https://doi.org/10.1117/12.2303004
KEYWORDS: Etching, Plasma etching, Chemical mechanical planarization, Optical lithography, Plasma, Lithography, Transmission electron microscopy, Silica, Polishing, Critical dimension metrology

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