Hiroyuki Nagasaka
at Nikon Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714015 (2008) https://doi.org/10.1117/12.804709
KEYWORDS: Immersion lithography, Semiconducting wafers, Lithography, Water, Liquids, Optical lithography, Double patterning technology, Extreme ultraviolet lithography, Semiconductors, Projection systems

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622
KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 653304 (2007) https://doi.org/10.1117/12.731916
KEYWORDS: Semiconducting wafers, Imaging systems, Double patterning technology, Water, Immersion lithography, Manufacturing, Lithography, Refractive index, Photoresist developing, Thin film coatings

Proceedings Article | 26 March 2007 Paper
Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa
Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252
KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615408 (2006) https://doi.org/10.1117/12.656887
KEYWORDS: Optics manufacturing, Semiconducting wafers, Water, Resonance energy transfer, Double patterning technology, Immersion lithography, Scanners, Combined lens-mirror systems, Particles, Projection systems

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top