Dr. Ioannis Karageorgos Profile

Dr. Ioannis Karageorgos

at imec

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Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper

Density driven placement of sub-DSA resolution assistant features (SDRAFs)

Daifeng Guo, Maryann Tung, Ioannis Karageorgos, H.-S. Philip Wong, Martin D. Wong

Proceedings Volume 10148, 101480E (2017) https://doi.org/10.1117/12.2257954

KEYWORDS: Directed self assembly, Algorithms, Electron beam lithography, Extreme ultraviolet lithography, Lithography, Mirrors, Semiconducting wafers, Polymers, Optical lithography, Manufacturing

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SPIE Journal Paper | 7 November 2016

Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits

Ioannis Karageorgos, Julien Ryckaert, Roel Gronheid, Maryann Tung, H.-S. Philip Wong, Evangelos Karageorgos, Kris Croes, Joost Bekaert, Geert Vandenberghe, Michele Stucchi, Wim Dehaene

JM3, Vol. 15, Issue 04, 043506, (November 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043506

KEYWORDS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet

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Proceedings Article | 18 March 2016 Paper

EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes

Roel Gronheid, Carolien Boeckx, Jan Doise, Joost Bekaert, Ioannis Karageorgos, Julien Ruckaert, Boon Teik Chan, Chenxi Lin, Yi Zou

Proceedings Volume 9776, 97761W (2016) https://doi.org/10.1117/12.2219876

KEYWORDS: Directed self assembly, Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Logic, Scanners, Etching, Immersion lithography, Stochastic processes, Personal protective equipment, Photomasks, Scanning electron microscopy, Metrology

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Proceedings Article | 16 March 2016 Paper

Design strategy for integrating DSA via patterning in sub-7 nm interconnects

Ioannis Karageorgos, Julien Ryckaert, Maryann Tung, H.-S. Wong, Roel Gronheid, Joost Bekaert, Evangelos Karageorgos, Kris Croes, Geert Vandenberghe, Michele Stucchi, Wim Dehaene

Proceedings Volume 9781, 97810N (2016) https://doi.org/10.1117/12.2222041

KEYWORDS: Directed self assembly, Optical lithography, Computer aided design, Photomasks, Extreme ultraviolet, Lithography, Design for manufacturability, Manufacturing, Immersion lithography, Double patterning technology, Algorithm development, Polymethylmethacrylate

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Proceedings Article | 19 March 2015 Paper

Implementation of templated DSA for via layer patterning at the 7nm node

Roel Gronheid, Jan Doise, Joost Bekaert, Boon Teik Chan, Ioannis Karageorgos, Julien Ryckaert, Geert Vandenberghe, Yi Cao, Guanyang Lin, Mark Somervell, Germain Fenger, Daisuke Fuchimoto

Proceedings Volume 9423, 942305 (2015) https://doi.org/10.1117/12.2086090

KEYWORDS: Optical lithography, Photomasks, Etching, Polymethylmethacrylate, Lithography, Double patterning technology, Scanning electron microscopy, Picosecond phenomena, Metals, Directed self assembly

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