Mr. Joydeep Mitra Profile

Joydeep Mitra

Senior Software Architect

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Author

Publications (8)

SPIE Journal Paper | 23 March 2018

Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

Joydeep Mitra, Andres Torres, Yuansheng Ma, David Pan

JM3, Vol. 17, Issue 01, 013508, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013508

KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

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Proceedings Article | 30 March 2017 Presentation + Paper

Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with Lamella DSA for sub-7 nm technology

Yuansheng Ma, Jongwook Kye, Gurdaman Khaira, Le Hong, James Word, Yuyang Sun, Joydeep Mitra, J. Andres Torres, Germain Fenger, Harry Levinson

Proceedings Volume 10148, 101480B (2017) https://doi.org/10.1117/12.2258056

KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

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Proceedings Article | 21 March 2017 Paper

Model-based guiding pattern synthesis for on-target and robust assembly of via and contact layers using DSA

Joydeep Mitra, Andres Torres, Yuansheng Ma, David Pan

Proceedings Volume 10144, 1014414 (2017) https://doi.org/10.1117/12.2257314

KEYWORDS: Calibration, Printing, Resolution enhancement technologies, Monte Carlo methods, Lithography, Model-based design, Optimization (mathematics), Detection and tracking algorithms, Directed self assembly, Connectors, Photomasks, Optical lithography

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Proceedings Article | 21 March 2017 Presentation + Paper

Process, design rule, and layout co-optimization for DSA based patterning of sub-10nm Finfet devices

Joydeep Mitra, Andres Torres, David Pan

Proceedings Volume 10144, 101440G (2017) https://doi.org/10.1117/12.2257313

KEYWORDS: Directed self assembly, Optical lithography, Monte Carlo methods, Photomasks, Manufacturing, Lithography, Double patterning technology, Printing, Optics manufacturing, Chemical analysis, Global Positioning System, Resolution enhancement technologies, Composites

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Proceedings Article | 21 March 2017 Presentation + Paper

Overview and development of EDA tools for integration of DSA into patterning solutions

J. Andres Torres, Germain Fenger, Daman Khaira, Yuansheng Ma, Yuri Granik, Chris Kapral, Joydeep Mitra, Polina Krasnova, Dehia Ait-Ferhat

Proceedings Volume 10144, 101440E (2017) https://doi.org/10.1117/12.2264178

KEYWORDS: Electronic design automation, Photomasks, Polymers, Optical lithography, Design for manufacturing, Lithography, Epitaxy, Inspection, Directed self assembly, Manufacturing, Systems modeling, Visualization, Data modeling

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Directed Self-Assembly is the method by which a self-assembly polymer is forced to follow a desired geometry defined or influenced by a guiding pattern. Such guiding pattern uses surface potentials, confinement or both to achieve polymer configurations that result in circuit-relevant topologies, which can be patterned onto a substrate.

Chemo, and grapho epitaxy of lines and space structures are now routinely inspected at full wafer level to understand the defectivity limits of the materials and their maximum resolution. In the same manner, there is a deeper understanding about the formation of cylinders using grapho-epitaxy processes. Academia has also contributed by developing methods that help reduce the number of masks in advanced nodes by “combining” DSA-compatible groups, thus reducing the total cost of the process.

From the point of view of EDA, new tools are required when a technology is adopted, and most technologies are adopted when they show a clear cost-benefit over alternative techniques. In addition, years of EDA development have led to the creation of very flexible toolkits that permit rapid prototyping and evaluation of new process alternatives. With the development of high-chi materials, and by moving away of the well characterized PS-PMMA systems, as well as novel integrations in the substrates that work in tandem with diblock copolymer systems, it is necessary to assess any new requirements that may or may not need custom tools to support such processes.

Hybrid DSA processes (which contain both chemo and grapho elements), are currently being investigated as possible contenders for sub-5nm process techniques. Because such processes permit the re-distribution of discontinuities in the regular arrays between the substrate and a cut operation, they have the potential to extend the number of applications for DSA.

This paper illustrates the reason as to why some DSA processes can be supported by existing rules and technology, while other processes require the development of highly customized correction tools and models. It also illustrates how developing DSA cannot be done in isolation, and it requires the full collaboration of EDA, Material’s suppliers, Manufacturing equipment, Metrology, and electronic manufacturers.

SPIE Journal Paper | 29 September 2016

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

Yuansheng Ma, Yan Wang, James Word, Junjiang Lei, Joydeep Mitra, Juan Andres Torres, Le Hong, Germain Fenger, Daman Khaira, Moshe Preil, Jongwook Kye, Harry Levinson

JM3, Vol. 15, Issue 03, 031610, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031610

KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

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Proceedings Article | 22 March 2016 Paper

Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

Yuansheng Ma, Yan Wang, James Word, Junjiang Lei, Joydeep Mitra, J. Andres Torres, Le Hong, Germain Fenger, Daman Khaira, Moshe Preil, Lei Yuan, Jongwook Kye, Harry Levinson

Proceedings Volume 9777, 97770N (2016) https://doi.org/10.1117/12.2219505

KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Directed self assembly, Immersion lithography, Extreme ultraviolet, Optical resolution, Neck, Modulation, Photomasks, Lens design, Ions, Neodymium, Visualization, Code division multiplexing

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Proceedings Article | 18 March 2015 Paper

Incorporating DSA in multipatterning semiconductor manufacturing technologies

Yasmine Badr, J. Torres, Yuansheng Ma, Joydeep Mitra, Puneet Gupta

Proceedings Volume 9427, 94270P (2015) https://doi.org/10.1117/12.2084776

KEYWORDS: Photomasks, Lithography, Electron beam lithography, Optical lithography, Directed self assembly, Manufacturing, Semiconductor manufacturing, Visualization, Annealing, Optics manufacturing

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Showing 5 of 8 publications

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