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Dr. Karen Dabertrand
at STMicroelectronics
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Author
Publications (4)
Proceedings Article | 2 April 2010 Paper
Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm
Bertrand Le Gratiet, Frank Sundermann, Jean Massin, Marianne Decaux, Nicolas Thivolle, Fabrice Baron, Alain Ostrovsky, Cedric Monget, Jean Damien Chapon, Yoann Blancquaert, Karen Dabertrand, Lionel Thevenon, Benedicte Bry, Nicolas Cluet, Bertrand Borot, Raphael Bingert, Thierry Devoivre, Pascal Gourard, Laurène Babaud, Ute Buttgereit, Robert Birkner, Mark Joyner, Erez Graitzer, Avi Cohen
Proceedings Volume 7638, 76380A (2010) https://doi.org/10.1117/12.845987
KEYWORDS: Photomasks, Critical dimension metrology, Metrology, Etching, Scanners, Semiconducting wafers, Airborne remote sensing, Logic, Optical lithography, Process control
Proceedings Article | 24 March 2009 Paper
Intrafield process control for 45 nm CMOS logic patterning
Bertrand Le Gratiet, Jean Massin, Alain Ostrovski, Cedric Monget, Marianne Decaux, Nicolas Thivolle, Romuald Faure, Fabrice Baron, Jean-Damien Chapon, Karen Dabertrand, Frank Sundermann, Pascal Gouraud, Laurène Babaud, Lionel Thevenon, Nicolas Cluet, Boris VandeWalle
Proceedings Volume 7272, 72722P (2009) https://doi.org/10.1117/12.812571
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Metrology, Optical lithography, Process control, Scatterometry, Logic
Proceedings Article | 22 March 2008 Paper
Process control for 45 nm CMOS logic gate patterning
Bertrand Le Gratiet, Pascal Gouraud, Enrique Aparicio, Laurene Babaud, Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Franck Foussadier, Frank Sundermann, Jean Massin, Jean-Damien Chapon, Maxime Gatefait, Blandine Minghetti, Jean de-Caunes, Daniel Boutin
Proceedings Volume 6922, 69220Z (2008) https://doi.org/10.1117/12.776889
KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Optical lithography, Scatterometry, Reticles, Scanners, Photomasks, Process control, Immersion lithography
Proceedings Article | 22 March 2008 Paper
Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning
Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Maxime Gatefait, Enrique Aparicio, Marco Polli, Jean-Claude Royer
Proceedings Volume 6922, 69220W (2008) https://doi.org/10.1117/12.771614
KEYWORDS: Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Etching, Single crystal X-ray diffraction, Semiconducting wafers, Diffractive optical elements, Carbon, Scatter measurement
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