Karen Huang
at JSR Micro Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 905118 (2014) https://doi.org/10.1117/12.2045617
KEYWORDS: Double patterning technology, Line width roughness, Optical lithography, Photoresist processing, Coating, Semiconducting wafers, Etching, Lithography, Photoresist materials, Plasma

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83251B (2012) https://doi.org/10.1117/12.916158
KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

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