Ke Cao
at Qualcomm Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 652111 (2007) https://doi.org/10.1117/12.708974
KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Optical proximity correction, Semiconducting wafers, Silicon, Image segmentation, Very large scale integration, Optimization (mathematics), Diffraction

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.538900
KEYWORDS: Computer aided design, Photomasks, Phase shifts, Phase shifting, Resolution enhancement technologies, Silicon, Lithography, Optical proximity correction, Solids, Optical lithography

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