Mark J. Mondry
Product Marketing Manager
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 May 2011 Paper
Mathew Schmidt, Christiane Poblenz, Yu-Chia Chang, Ben Li, Mark Mondry, Justin Iveland, Michael Krames, Richard Craig, James Raring, James Speck, Steven DenBaars, Shuji Nakamura
Proceedings Volume 8039, 80390D (2011) https://doi.org/10.1117/12.884458
KEYWORDS: Semiconductor lasers, Gallium nitride, Laser applications, Continuous wave operation, Diodes, Laser marking, Defense and security, Polarization, Laser damage threshold, Temperature metrology

Proceedings Article | 4 March 2011 Paper
James Raring, Mathew Schmidt, Christiane Poblenz, Ben Li, Yu-Chia Chang, Mark Mondry, You-Da Lin, Michael Krames, Richard Craig, James Speck, Steven DenBaars, Shuji Nakamura
Proceedings Volume 7939, 79390Y (2011) https://doi.org/10.1117/12.872023
KEYWORDS: Semiconductor lasers, Gallium nitride, Continuous wave operation, High power lasers, Laser applications, Polarization, Laser damage threshold, Second-harmonic generation, Temperature metrology, Solid state lasers

Proceedings Article | 15 February 2006 Paper
Proceedings Volume 6104, 610408 (2006) https://doi.org/10.1117/12.659907
KEYWORDS: High power lasers, Reliability, Continuous wave operation, Structural design, Laser applications, Waveguides, Amplifiers, Semiconductor lasers, Diodes

Proceedings Article | 17 March 2005 Paper
Hailong Zhou, Mark Mondry, Michael Fouksman, Eli Weiss, Serguei Anikitchev, Keith Kennedy, Jun Li, Erik Zucker, Paul Rudy, Jukka Kongas, Jouko Haapamaa, Sami Lehkonen
Proceedings Volume 5711, (2005) https://doi.org/10.1117/12.589860
KEYWORDS: Reliability, Laser phosphor displays, Semiconductor lasers, Laser development, Fiber lasers, Materials processing, High power diode lasers, Manufacturing, Epitaxy

Proceedings Article | 29 March 1996 Paper
Eva Strzelecka, G. Thompson, Gerald Robinson, Matthew Peters, Brian Thibeault, Mark Mondry, Vijaysekhar Jayaraman, Frank Peters, Larry Coldren
Proceedings Volume 2691, (1996) https://doi.org/10.1117/12.236925
KEYWORDS: Lenses, Sensors, Gallium arsenide, Etching, Semiconducting wafers, Semiconductor lasers, Optical interconnects, Photomasks, Microlens, Semiconductors

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