Matthew J. Sendelbach
Principal Process Engineer at TEL Technology Ctr America LLC
SPIE Involvement:
Conference Chair | Editor | Author
Websites:
Publications (50)

Proceedings Article | 23 February 2021 Presentation
Proceedings Volume 11611, 1161114 (2021) https://doi.org/10.1117/12.2584617

Proceedings Article | 2 July 2019 Presentation + Paper
Dexin Kong, Koichi Motoyama, Abraham Arceo de la peña, Huai Huang, Brock Mendoza, Mary Breton, Gangadhara Raja Muthinti, Hosadurga Shobha, Liying Jiang, Juntao Li, James Demarest, John Gaudiello, Gauri Karve, Aron Cepler, Matthew Sendelbach, Susan Emans, Paul Isbester, Kavita Shah, Shay Wolfing, Avron Ger
Proceedings Volume 10959, 109590A (2019) https://doi.org/10.1117/12.2515257
KEYWORDS: Metrology, Machine learning, Scatterometry, Copper

Proceedings Article | 25 June 2019 Open Access Paper
Proceedings Volume 10959, 1095932 (2019) https://doi.org/10.1117/12.2541616
KEYWORDS: Machine learning, Metrology, Inspection, Process control, Optical lithography, Capacitance, Lithography

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109590F (2019) https://doi.org/10.1117/12.2515806
KEYWORDS: Machine learning, Semiconducting wafers, Capacitance, Resistance, Critical dimension metrology, Etching, Process control, Diffractive optical elements, Oxides, Scatterometry

Proceedings Article | 19 September 2018 Paper
Guido Rademaker, Yoann Blancquaert, Thibault Labbaye, Lucie Mourier, Nivea Figueiro, Francisco Sanchez, Roy Koret, Jonathan Pradelles, Stéfan Landis, Stéphane Rey, Ronny Haupt, Barak Bringoltz, Michael Shifrin, Daniel Kandel, Avron Ger, Matthew Sendelbach, Shay Wolfling, Laurent Pain
Proceedings Volume 10775, 1077508 (2018) https://doi.org/10.1117/12.2326595
KEYWORDS: Machine learning, Scatterometry, Semiconducting wafers, Lithography, Metrology, Channel projecting optics, Wafer-level optics, Reflectance spectroscopy, Inverse optics, Electron beam direct write lithography, Maskless lithography

Showing 5 of 50 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 29 April 2024

SPIE Conference Volume | 24 May 2023

SPIE Conference Volume | 5 July 2022

Conference Committee Involvement (14)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 14 Conference Committees
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