Dr. Michael W. Lin Profile

Dr. Michael W. Lin

Graduate Research Assistant at Univ of Texas at Austin

SPIE Involvement:

Author

Publications (11)

SPIE Journal Paper | 16 July 2014 Open Access

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson

JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302

KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

Read Abstract +

DOWNLOAD PAPER

SPIE Journal Paper | 24 September 2013 Open Access

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

JM3, Vol. 12, Issue 03, 031114, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031114

KEYWORDS: Lithography, Head-mounted displays, Glasses, Optical lithography, Microfluidics, Nanoimprint lithography, Interfaces, Natural surfaces, Chemistry, Failure analysis

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 4 April 2011 Paper

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

Proceedings Volume 7970, 79700T (2011) https://doi.org/10.1117/12.871627

KEYWORDS: Fluorine, Silicon, Lithography, Head-mounted displays, Glasses, Optical lithography, Nanoimprint lithography, Interfaces, Information operations, Adhesives

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses

Satoshi Takei, Michael Lin, Sangwoong Yoon, Tomoya Ohashi, Yasuyuki Nakajima, C. Grant Willson

Proceedings Volume 7273, 72730W (2009) https://doi.org/10.1117/12.813530

KEYWORDS: Ultraviolet radiation, Coating, Lithography, Etching, Semiconducting wafers, Liquids, Chemical analysis, Antireflective coatings, Dielectrics, Industrial chemicals

Read Abstract +

SPIE Journal Paper | 1 July 2008

Role of surfactants in adhesion reduction for step and flash imprint lithography

Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kim, Kuan-Hsun Lu, Kenneth Liechti, John Ekerdt, Paul Ho, C. Grant Willson

JM3, Vol. 7, Issue 03, 033005, (July 2008) https://doi.org/10.1117/12.10.1117/1.2968269

KEYWORDS: Polymers, Interfaces, Quartz, Adhesives, Etching, Liquids, Silicon, Lithography, Mechanics, Natural surfaces

Read Abstract +

SPIE Journal Paper | 1 April 2008

Simulation and design of planarizing materials for reverse-tone step and flash imprint lithography

Michael Lin, Brook Chao, Jianjun Hao, Kyle Osberg, Paul Ho, C. Grant Willson

JM3, Vol. 7, Issue 02, 023008, (April 2008) https://doi.org/10.1117/12.10.1117/1.2896047

KEYWORDS: Etching, Silicon, Lithography, Capillaries, Ultraviolet radiation, Coating, Liquids, Polymers, Optical lithography, Data modeling

Read Abstract +

Proceedings Article | 20 March 2008 Paper

Interfacial adhesion studies for step and flash imprint lithography

Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kyoon Kim, Kuan Lu, Li Tao, Kenneth Liechti, John Ekerdt, Paul Ho, Walter Hu, C. Grant Willson

Proceedings Volume 6921, 69210E (2008) https://doi.org/10.1117/12.772797

KEYWORDS: Polymers, Quartz, Interfaces, Etching, Mechanics, Lithography, Liquids, Adhesives, Silicon, Polymer thin films

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Photocurable silicon-based materials for imprinting lithography

Jianjun Hao, Michael Lin, Frank Palmieri, Yukio Nishimura, Huang-Lin Chao, Michael Stewart, Austin Collins, Kane Jen, C. Grant Willson

Proceedings Volume 6517, 651729 (2007) https://doi.org/10.1117/12.712261

KEYWORDS: Silicon, Dielectrics, Molecules, Lithography, Annealing, Bromine, Front end of line, Back end of line, Chlorine, Optical lithography

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Multilevel step and flash imprint lithography for direct patterning of dielectrics

Wei-Lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C. Grant Willson

Proceedings Volume 6517, 65170K (2007) https://doi.org/10.1117/12.711602

KEYWORDS: Etching, Silicon, Lithography, Optical lithography, Back end of line, Diamond, Dielectrics, Copper, Scanning electron microscopy, Liquids

Read Abstract +

Proceedings Article | 27 March 2006 Paper

Planarization for Reverse-Tone Step and Flash Imprint Lithography

Michael Lin, Huang-Lin Chao, Jianjun Hao, Eui Kim, Frank Palmieri, Woon Kim, Michael Dickey, Paul Ho, C. Willson

Proceedings Volume 6151, 61512G (2006) https://doi.org/10.1117/12.655626

KEYWORDS: Etching, Silicon, Lithography, Capillaries, Thin films, Silicon films, Safety, Interferometry, Semiconducting wafers, Photomasks

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years