Michael B. Pike
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 2 May 2016
JM3, Vol. 15, Issue 02, 021406, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021406
KEYWORDS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942613 (2015) https://doi.org/10.1117/12.2085887
KEYWORDS: Overlay metrology, Scanners, Distortion, Reticles, Semiconducting wafers, Optical lithography, Photomasks, Optical alignment, Lithographic illumination, Error analysis

Proceedings Article | 31 March 2014 Paper
T. Brunner, V. Menon, C. Wong, N. Felix, M. Pike, O. Gluschenkov, M. Belyansky, P. Vukkadala, S. Veeraraghavan, S. Klein, C. H. Hoo, J. Sinha
Proceedings Volume 9052, 90520U (2014) https://doi.org/10.1117/12.2045715
KEYWORDS: Semiconducting wafers, Overlay metrology, Electronic support measures, Distortion, Optical alignment, Metrology, Photomasks, Lithography, Silicon, Laser range finders

Proceedings Article | 4 April 2012 Paper
Proceedings Volume 8324, 832408 (2012) https://doi.org/10.1117/12.916483
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Manufacturing, Control systems, Semiconductor manufacturing, Data modeling, Process control, Metrology

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764015 (2010) https://doi.org/10.1117/12.849225
KEYWORDS: Overlay metrology, Semiconducting wafers, Scanners, Manufacturing, Reticles, Lithography, Optics manufacturing, Laser scanners, 3D scanning, Software development

Showing 5 of 7 publications
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