Nicolo Morgana
Senior Staff Engineer at Infineon Technologies Dresden
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 19 September 2018 Paper
Jens Schneider, Dieter Kaiser, Nicolo Morgana, Marcel Heller, Henning Feick
Proceedings Volume 10775, 107750W (2018) https://doi.org/10.1117/12.2326006
KEYWORDS: Photomasks, Photoresist processing, Grayscale lithography, Lithography, Semiconductor manufacturing, Manufacturing, Ions, Semiconducting wafers, Doping, Ion implantation

Proceedings Article | 26 March 2015 Paper
Nicoló Morgana, Dmitrii Gavrilin, Andreas Greiner, Detlef Hofmann, Itaru Kamohara, Ulrich Klostermann, Holger Moeller, Juergen Preuninger
Proceedings Volume 9426, 94260S (2015) https://doi.org/10.1117/12.2086075
KEYWORDS: Optical alignment, Semiconducting wafers, Signal processing, Silicon, Oxides, Computer simulations, Manufacturing, Visualization, Metals, Etching

Proceedings Article | 12 April 2013 Paper
Marcel Heller, Dieter Kaiser, Maik Stegemann, Georg Holfeld, Nicoló Morgana, Jens Schneider, Daniel Sarlette
Proceedings Volume 8683, 868310 (2013) https://doi.org/10.1117/12.2008847
KEYWORDS: Etching, Oxides, Photoresist materials, Photomasks, Semiconducting wafers, Reactive ion etching, Grayscale lithography, Lithography, Ions, Atomic force microscopy

SPIE Journal Paper | 1 January 2009
Christoph Noelscher, Marcel Heller, Matthias Markert, Dietmar Temmler, Franck Jauzion-Graverolle, Nicolo Morgana, Ulrich Scheler, Bee-Kim Hong, Ulrich Egger, Vadim Timoshkov, Mirko Vogt
JM3, Vol. 8, Issue 01, 011005, (January 2009) https://doi.org/10.1117/12.10.1117/1.3066296
KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

Proceedings Article | 1 April 2008 Paper
Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer
Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

Showing 5 of 19 publications
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