Mr. Omprakash Jaiswal Profile

Omprakash Jaiswal

Staff Research Engineer at IBM India Private Ltd

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Author

Publications (5)

Proceedings Article | 18 March 2015 Paper

Experiments using automated sample plan selection for OPC modeling

Ramya Viswanathan, Om Jaiswal, Nathalie Casati, Amr Abdo, James Oberschmidt, Josef Watts, Maria Gabrani

Proceedings Volume 9426, 94260W (2015) https://doi.org/10.1117/12.2086049

KEYWORDS: Statistical modeling, Surface plasmons, Calibration, Data modeling, Optical proximity correction, Metrology, Semiconducting wafers, Optical lithography, Integrated circuit design, Mathematical modeling

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Proceedings Article | 31 March 2014 Paper

Automated sample plan selection for OPC modeling

Nathalie Casati, Maria Gabrani, Ramya Viswanathan, Zikri Bayraktar, Om Jaiswal, David DeMaris, Amr Abdo, James Oberschmidt, Andreas Krause

Proceedings Volume 9052, 90520J (2014) https://doi.org/10.1117/12.2045461

KEYWORDS: Data modeling, Surface plasmons, Calibration, Optical proximity correction, Statistical modeling, Optical lithography, Process modeling, Printing, Image processing, Image quality

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Proceedings Article | 23 May 2011 Paper

Evaluation of process variations on OPC model predictions

James Oberschmidt, Samit Barai, Tamer Desouky, Om Prakash Jaiswal, Aditya Padmawar, Ramana Murthy Pusuluri

Proceedings Volume 8081, 80810O (2011) https://doi.org/10.1117/12.897531

KEYWORDS: Photomasks, Data modeling, Calibration, Critical dimension metrology, Optical proximity correction, Process modeling, Semiconducting wafers, Lithography, Polarization, Wafer-level optics

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SPIE Journal Paper | 1 October 2010

Electrical validation of through-process optical proximity correction verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

JM3, Vol. 9, Issue 04, 041303, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514703

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

Electrical validation of through process OPC verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

Proceedings Volume 7638, 76380U (2010) https://doi.org/10.1117/12.846572

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Optical simulations, Process modeling, Optical lithography, Optical components, Image processing

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