Dr. Oscar Noordman Profile

Dr. Oscar Noordman

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 4 March 2010 Paper

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Jörg Zimmermann, Paul Gräupner, Jens Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht

Proceedings Volume 7640, 764005 (2010) https://doi.org/10.1117/12.847282

KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

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Proceedings Article | 4 March 2010 Paper

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre

Proceedings Volume 7640, 76401P (2010) https://doi.org/10.1117/12.845984

KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Source mask optimization, Imaging systems, Electroluminescence, Polarization, Semiconducting wafers, Photomasks, Light

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Proceedings Article | 11 December 2009 Paper

Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, Oscar Noordman, Robert Kazinczi, Gert Streutker, Bert van Drieenhuizen, Stephen Hsu, Keith Gronlund, Markus Degünther, Dirk Jürgens, Johannes Eisenmenger, Michael Patra, Andras Major

Proceedings Volume 7520, 75200Y (2009) https://doi.org/10.1117/12.837035

KEYWORDS: Mirrors, Fiber optic illuminators, Diffractive optical elements, Source mask optimization, Micromirrors, Light, Metrology, Semiconducting wafers, Switching, Scanners

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SPIE Journal Paper | 1 October 2009

Speckle in optical lithography and its influence on linewidth roughness

Oscar Noordman, Andrey Tychkov, Jan Baselmans, James Tsacoyeanes, Gary Politi, Michael Patra, Vladan Blahnik, Manfred Maul

JM3, Vol. 8, Issue 04, 043002, (October 2009) https://doi.org/10.1117/12.10.1117/1.3256131

KEYWORDS: Speckle, Speckle pattern, Line width roughness, Reticles, Optical lithography, Semiconducting wafers, Temporal coherence, Pulsed laser operation, Spatial coherence, Spatial frequencies

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Proceedings Article | 16 March 2009 Paper

Speckle in optical lithography and the influence on line width roughness

Oscar Noordman, Andrey Tychkov, Jan Baselmans, James Tsacoyeanes, Gary Politi, Michael Patra, Vladan Blahnik, Manfred Maul

Proceedings Volume 7274, 72741R (2009) https://doi.org/10.1117/12.814169

KEYWORDS: Speckle, Line width roughness, Speckle pattern, Reticles, Temporal coherence, Semiconducting wafers, Optical lithography, Pulsed laser operation, Spatial frequencies, Spatial coherence

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Proceedings Article | 17 May 2005 Paper

Etch, reticle, and track CD fingerprint corrections with local dose compensation

Hans van der Laan, Rene Carpaij, Jouke Krist, Oscar Noordman, Youri van Dommelen, Jan van Schoot, Frans Blok, Christian van Os, Sander Stegeman, Tom Hoogenboom, Craig Hickman, Erik Byers, Troy Gugel

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.602129

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Etching, Scanners, Manufacturing, Actuators, Feedback control, Data modeling, Feedback loops

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Proceedings Article | 26 June 2003 Paper

Optimizing and enhancing optical systems to meet the low k₁ challenge

Donis Flagello, Robert Socha, Xuelong Shi, Jan van Schoot, Jan Baselmans, Mark van de Kerkhof, Wim de Boeij, Andre Engelen, Rene Carpaij, Oscar Noordman, Marco Moers, Melchior Mulder, Jo Finders, Henk van Greevenbroek, Martin Schriever, Manfred Maul, Helmut Haidner, Markus Goeppert, Ulrich Wegmann, Paul Graeupner

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485340

KEYWORDS: Lithographic illumination, Reticles, Wavefronts, Sensors, Semiconducting wafers, Light scattering, Lithography, Critical dimension metrology, Scanners, Control systems

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Proceedings Article | 30 July 2002 Paper

CD uniformity improvement by active scanner corrections

Jan van Schoot, Oscar Noordman, Peter Vanoppen, Frans Blok, Donggyu Yim, Chan-Ha Park, Byeong-Ho Cho, Thomas Theeuwes, Young-Hong Min

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474579

KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Critical dimension metrology, Optical lithography, Etching, Scanning electron microscopy, Metrology, Thin film coatings, Actuators

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Proceedings Article | 26 April 2001 Paper

Analysis of full-wafer/full-batch CD uniformity using electrical linewidth measurements

Peter Vanoppen, Oscar Noordman, Jan Baselmans, Jan van Schoot

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425226

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Error analysis, Data modeling, Statistical analysis, Photoresist processing, Etching, Data acquisition, Photomasks

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Proceedings Article | 24 September 1997 Paper

Optimization of LPCVD silicon oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Kerstin Woerhoff, Paul Lambeck, H. Albers, Oscar Noordman, Niko van Hulst, Th. Popma

Proceedings Volume 3099, (1997) https://doi.org/10.1117/12.281235

KEYWORDS: Refractive index, Silicon, Low pressure chemical vapor deposition, Protactinium, Semiconducting wafers, Waveguides, Silicon films, Prisms, Thin films, Birefringence

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Proceedings Article | 1 May 1992 Paper

Operation of a scanning near-field optical microscope in reflection in combination with a scanning force microscope

Niko van Hulst, Marco Moers, Oscar Noordman, T. Faulkner, F. Segerink, Kees van der Werf, Bart de Grooth, Bouwe Bolger

Proceedings Volume 1639, (1992) https://doi.org/10.1117/12.58190

KEYWORDS: Near field scanning optical microscopy, Microscopes, Near field optics, Atomic force microscopy, Reflection, Optical microscopes, Scanning probe microscopy, Compact discs, Semiconductor lasers, Image resolution

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Showing 5 of 11 publications

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