CONFERENCE PROCEEDINGS
Advanced Search
Peisheng Li
at ChangXin Memory Technologies, Inc.
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 21 November 2023 Poster + Paper
An advanced 2D feature transmitted algorithm for mask defect detection
Yilei Zeng, Yi Cheng, Mengyao Jin, Hunter Li
Proceedings Volume 12751, 127510Z (2023) https://doi.org/10.1117/12.2684046
KEYWORDS: Semiconducting wafers, Inspection, Transmittance, Algorithm development, Air contamination, Image processing, Detection and tracking algorithms, Defect detection, Visualization, Inspection equipment
Proceedings Article | 21 November 2023 Poster + Paper
Research of mask photoresist sensitivity for local critical dimension uniformity improvement in ArF lithography
Proceedings Volume 12751, 1275119 (2023) https://doi.org/10.1117/12.2687170
KEYWORDS: Photoresist materials, Lithography, Semiconducting wafers, Advanced patterning, Semiconductors, Photoresist developing, Shrinkage, Power consumption, Line width roughness, Line edge roughness
Proceedings Article | 1 December 2022 Poster + Paper
Research of high-transmission phase-shift mask on critical dimension uniformity in ArF lithography
Proceedings Volume 12293, 122930X (2022) https://doi.org/10.1117/12.2641687
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Nanoimprint lithography, Phase shifts, Metrology, Scanning electron microscopy, Polarization, Lithographic illumination, Transmittance
Proceedings Article | 1 December 2022 Paper
Haze classification based on location for COG mask
Proceedings Volume 12293, 122930W (2022) https://doi.org/10.1117/12.2640331
KEYWORDS: Air contamination, Photomasks, Semiconducting wafers, Quartz, Manufacturing, Mask cleaning
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top