Dr. Rawi Dirawi Profile

Dr. Rawi Dirawi

at ASML Netherlands BV

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Author

Publications (6)

Proceedings Article | 27 April 2023 Presentation + Paper

Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi

Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678

KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing

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Proceedings Article | 27 April 2023 Poster + Paper

ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control

Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi

Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632

KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators

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Proceedings Article | 26 May 2022 Poster + Paper

OPO reduction in scatterometry metrology by rotated quadrupole illumination

Rawi Dirawi, Tal Yaziv, Renan Milo, Nadav Gutman, Ohad Bachar

Proceedings Volume 12053, 120531H (2022) https://doi.org/10.1117/12.2608255

KEYWORDS: Metrology, Overlay metrology, Scatterometry, Diffraction, Semiconductors, Wavelength tuning, Wafer testing, Specular reflections, Spectral resolution, Diffractive optical elements, Semiconductor manufacturing, Wafer inspection

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Proceedings Article | 26 May 2022 Poster + Paper

Prediction and optimization of small scatterometry based overlay targets

Rawi Dirawi, Shlomit Katz, Renan Milo, Nadav Gutman

Proceedings Volume 12053, 120531E (2022) https://doi.org/10.1117/12.2608241

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconductors, Semiconductor manufacturing, Manufacturing, Inspection, Standards development

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Proceedings Article | 22 February 2021 Presentation + Paper

Signal weighted overlay optimizer for scatterometry metrology

A. Yagil, R. Dirawi, W. L. Lin, A. Volfman, Y. Men, R. Milo, T. Yaziv, Y. Lamhot

Proceedings Volume 11611, 1161124 (2021) https://doi.org/10.1117/12.2583866

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Principal component analysis, Optical parametric oscillators, Mathematical modeling, Detection and tracking algorithms, Algorithm development

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Proceedings Article | 22 February 2021 Presentation + Paper

Process variation impacts on optical overlay accuracy signature

Rawi Dirawi, Shlomit Katz, Roie Volkovich

Proceedings Volume 11611, 116112P (2021) https://doi.org/10.1117/12.2583616

KEYWORDS: Semiconducting wafers, Wafer-level optics, Tin, Etching, Chemical mechanical planarization, Amorphous silicon

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Showing 5 of 6 publications

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