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Rico Nestler
at Advanced Mask Technology Ctr. GmbH Co. KG
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Publications (1)
Proceedings Article | 3 October 2018 Presentation + Paper
Multiple exposure on single blank for electron-beam writer characterization
André Eilert, Michael Finken, Christian Bürgel, Mark Herrmann, Ronald Hellriegel, Rico Nestler, Oliver Löffler, Frank Hübenthal, Rico Büttner, Katja Steidel
Proceedings Volume 10810, 108101G (2018) https://doi.org/10.1117/12.2501760
KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Critical dimension scanning electron microscopy, Electrons, Materials processing, Thin films, Scatterometry, Optical proximity correction, Electron beam lithography, Electron beams
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