Dr. Takayuki Abe Profile

Dr. Takayuki Abe

Marketing at NuFlare Technology Inc

Proceedings Article | 14 October 2011 Paper

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Hiroshi Matsumoto, Yasuo Kato, Tomoo Motosugi, Jun Yashima, Takayuki Abe, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori

Proceedings Volume 8166, 816620 (2011) https://doi.org/10.1117/12.898846

KEYWORDS: Forward error correction, Critical dimension metrology, Modulation, Photomasks, Data processing, Data corrections, Software development, Scattering, Data modeling, Electron beam melting

Read Abstract +

SPIE Journal Paper | 1 October 2008

High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account

Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama

JM3, Vol. 7, Issue 04, 043008, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013546

KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

Read Abstract +

SPIE Journal Paper | 1 April 2008

High-accuracy correction of critical dimension errors appearing in large-scale integration fabrication processes

Takayuki Abe, Jun Yashima, Hayato Shibata

JM3, Vol. 7, Issue 02, 023006, (April 2008) https://doi.org/10.1117/12.10.1117/1.2909474

KEYWORDS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Solution for 100 nm: EBM-4000

Yoshiaki Hattori, Kiyoshi Hattori, Ken-ichi Murooka, Takayuki Abe, Satoshi Yasuda, Taiga Uno, Eiji Murakami, Noriaki Nakayamada, Naoharu Shimomura, Ttsuyoshi Yamashita, Noboru Yamada, Akihiro Sakai, Hirohiko Honda, Toshiaki Shimoyama, Kiyoshi Nakaso, Hideo Inoue, Yoshiaki Onimaru, Keiichi Makiyama, Yoji Ogawa, Tadahiro Takigawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476926

KEYWORDS: Photomasks, Control systems, Computing systems, Optical proximity correction, Electron beams, Critical dimension metrology, Optical amplifiers, Data communications, Beam shaping, Amplifiers

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Control of resist heating effect

Hirohito Anze, Takayuki Abe, Hideaki Sakurai, Tomohiro Iijima, Yoshiaki Hattori, Noriaki Nakayamada, Takashi Kamikubo

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390061

KEYWORDS: Critical dimension metrology, Photomasks, HVAC controls, Electron beams, Diffusion, Mask making, Vestigial sideband modulation, Control systems, Analytical research, Microelectronics

Read Abstract +

Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

Read Abstract +

Proceedings Article | 25 August 1999 Paper

Resist heating effect on 50-KeV EB mask writing

Hideaki Sakurai, Takayuki Abe, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Iwao Higashikawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360210

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Chemically amplified resists, Diffusion, Error analysis, Standards development, Semiconductors, Optical simulations, Mask making

Read Abstract +

Proceedings Article | 1 September 1998 Paper

Process optimization for mask fabrication

Hideaki Sakurai, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328799

KEYWORDS: Photomasks, Photoresist processing, Mask making, Electron beams, Chemically amplified resists, Quartz, Error analysis, Critical dimension metrology, X-ray technology, Coating

Read Abstract +

Proceedings Article | 28 July 1997 Paper

Proximity effect correction for reticle fabrication

Takashi Kamikubo, Takayuki Abe, Susumu Oogi, Hirohito Anze, Mitsuko Shimizu, Masamitsu Itoh, Tetsuro Nakasugi, Tomohiro Iijima, Yoshiaki Hattori

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277291

KEYWORDS: Reticles, Electron beams, Semiconductors, Error analysis, Analytical research, Process engineering, Microelectronics, Electron beam melting, Manufacturing, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 27 May 1996 Paper

CD uniformity of photomasks written with high-voltage variable-shaped e beam

Noriaki Nakayamada, Shigehiro Hara, Toshiyuki Magoshi, Hideaki Sakurai, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240462

KEYWORDS: Vestigial sideband modulation, Photomasks, Calibration, Critical dimension metrology, Laser scattering, Scattering, Error analysis, Electron beam lithography, Optics manufacturing, Photoresist processing

Read Abstract +

Proceedings Article | 3 November 1994 Paper

Possibility of real-time proximity effect correction for reticle writing

Takayuki Abe

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191930

KEYWORDS: Reticles, X-ray technology, Data conversion, Photomasks, Scattering, X-rays, Parallel processing, Backscatter, Electron beams, Laser scattering

Read Abstract +

Showing 5 of 11 publications

Conference Committee Involvement (10)

Photomask and Next Generation Lithography Mask Technology XIX

17 April 2012 |

Photomask and Next Generation Lithography Mask Technology XVII

13 April 2010 |

Photomask and Next Generation Lithography Mask Technology XVII

13 April 2010 |

Photomask and Next Generation Lithography Mask Technology XVI

8 April 2009 |

Photomask and Next Generation Lithography Mask Technology XV

16 April 2008 |

Showing 5 of 10 Conference Committees

Keywords/Phrases

Search In:

Publication Years