Dr. Tokuyuki Honda Profile

Dr. Tokuyuki Honda

Manager at Canon USA Inc

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 15 February 2017 Paper

Paper

Ultraminiature video-rate forward-view spectrally encoded endoscopy with straight axis configuration

Zhuo Wang, Tzu-Yu Wu, Mark Hamm, Alexander Altshuler, Anderson Mach, Donald Gilbody, Bin Wu, Santosh Ganesan, James Chung, Mitsuhiro Ikuta, Jacob Brauer, Seiji Takeuchi, Tokuyuki Honda

Proceedings Volume 10040, 100400M (2017) https://doi.org/10.1117/12.2253020

KEYWORDS: Endoscopes, Endoscopy, Optical design, Optical components, Diffraction gratings, Surgery, Spectroscopy, Image processing software, Diffraction, Neodymium, Reflection, Imaging systems

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SPIE Journal Paper | 1 July 2009

Aerial image back propagation with two-dimensional transmission cross coefficient

Kenji Yamazoe, Yoshiyuki Sekine, Tokuyuki Honda

JM3, Vol. 8, Issue 03, 031406, (July 2009) https://doi.org/10.1117/12.10.1117/1.3206980

KEYWORDS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography

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Proceedings Article | 18 March 2009 Paper

Paper

Development status of Canon's full-field EUVL tool

Takayuki Hasegawa, Shigeyuki Uzawa, Tokuyuki Honda, Yoshinari Higaki, Akira Miyake, Hideki Morishima

Proceedings Volume 7271, 72711Y (2009) https://doi.org/10.1117/12.813465

KEYWORDS: Carbon, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Protactinium, Nanoimprint lithography, Critical dimension metrology, Projection systems, Photomasks, Polishing

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SPIE Journal Paper | 1 January 2009

Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch

Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai

JM3, Vol. 8, Issue 01, 013003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3059551

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

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Proceedings Article | 19 May 2008 Paper

Paper

Extension of the 2D-TCC technique to optimize mask pattern layouts

Manabu Hakko, Kenji Yamazoe, Miyoko Kawashima, Yoshiyuki Sekine, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 7028, 70280Z (2008) https://doi.org/10.1117/12.793041

KEYWORDS: Photomasks, Calcium, Optical proximity correction, Curium, Printing, Semiconducting wafers, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Computer simulations

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Proceedings Article | 21 March 2008 Paper

Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 7 March 2008 Paper

Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Miyoko Kawashima, Kenji Yamazoe, Yoshiyuki Sekine, Manabu Hakko, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 6924, 69240F (2008) https://doi.org/10.1117/12.771943

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Source mask optimization, Photomasks, Fourier transforms, Critical dimension metrology, Scattering, Cadmium, Image enhancement, Image transmission

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Proceedings Article | 30 October 2007 Paper

Paper

Resolution enhancement by aerial image approximation with 2D-TCC

Kenji Yamazoe, Yoshiyuki Sekine, Miyoko Kawashima, Manabu Hakko, Tomomi Ono, Tokuyuki Honda

Proceedings Volume 6730, 67302H (2007) https://doi.org/10.1117/12.746862

KEYWORDS: Reticles, SRAF, Image enhancement, Fourier transforms, Resolution enhancement technologies, Light sources, Image resolution, Polarization, Printing, Binary data

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Proceedings Article | 26 March 2007 Paper

Paper

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Eiji Sakamoto, Keita Sakai, Akihiro Yamada, Tokuyuki Honda

Proceedings Volume 6520, 65201Q (2007) https://doi.org/10.1117/12.711940

KEYWORDS: Refractive index, Transmittance, Silica, Temperature metrology, Projection systems, Semiconducting wafers, Immersion lithography, Microfluidics, Absorption, Water

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Proceedings Article | 26 March 2007 Paper

Paper

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, Yuichi Iwasaki, Seiji Takeuchi, Minoru Yoshii, Tokuyuki Honda

Proceedings Volume 6520, 65203L (2007) https://doi.org/10.1117/12.711420

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Immersion lithography, Polymers, Interferometry, Lithography, Optical lithography, Optical simulations, Image resolution

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SPIE Journal Paper | 1 October 2006

Influence of resist blur on ultimate resolution of ArF immersion lithography

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

JM3, Vol. 5, Issue 04, 043004, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397018

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography

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Proceedings Article | 15 March 2006 Paper

Paper

What determines the ultimate resolution? The critical relationship between exposure tools and photoresists

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

Proceedings Volume 6154, 615422 (2006) https://doi.org/10.1117/12.656123

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Photoresist materials, Semiconducting wafers, Immersion lithography, Refractive index, Chemically amplified resists, Extreme ultraviolet lithography, Scanners

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Proceedings Article | 12 May 2005 Paper

Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 12 May 2005 Paper

Paper

Development of ArF immersion exposure tool

Hitoshi Nakano, Hideo Hata, Kazuhiro Takahashi, Mikio Arakawa, Takahito Chibana, Tokuyuki Honda, Keiko Chiba, Sunao Mori

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600492

KEYWORDS: Semiconducting wafers, Water, Contamination, Control systems, Immersion lithography, Scanners, Transmittance, Temperature metrology, Optical lithography, Microfluidics

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Proceedings Article | 28 May 2004 Paper

Paper

ArF immersion lithography: critical optical issues

Tokuyuki Honda, Yasuhiro Kishikawa, Toshinobu Tokita, Hiroshi Ohsawa, Miyoko Kawashima, Akinori Ohkubo, Minoru Yoshii, Koji Uda, Akiyoshi Suzuki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534024

KEYWORDS: Semiconducting wafers, Immersion lithography, Photomasks, Diffraction, Water, Liquids, Interferometry, Refractive index, Glasses, Lithography

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Proceedings Article | 5 November 1998 Paper

Paper

Properties of compositional volume grating formation with photoinitiated cationic-ring-opening polymerization

Loukas Paraschis, Yasuyuki Sugiyama, Annapoorna Akella, Tokuyuki Honda, Lambertus Hesselink

Proceedings Volume 3468, (1998) https://doi.org/10.1117/12.330437

KEYWORDS: Diffraction gratings, Holography, Polymerization, Diffusion, Polymers, Diffraction, Digital holography, Data storage, Holographic data storage systems, Digital recording

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Proceedings Article | 1 July 1990 Paper

Paper

Interferometric measurement of the optical penetration depth into a processed surface

Hirokazu Matsumoto, Yucong Zhu, Tokuyuki Honda

Proceedings Volume 1319, (1990) https://doi.org/10.1117/12.34889

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Showing 5 of 17 publications

Conference Committee Involvement (3)

SPIE Lithography Asia - Korea

13 October 2010 | n/a, Republic of Korea

SPIE Lithography Asia - Taiwan

18 November 2009 | Taipei, Taiwan

SPIE Lithography Asia - Taiwan

4 November 2008 | Taipei, Taiwan

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