CONFERENCE PROCEEDINGS
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Dr. Valeriy Sukharev
at Siemens EDA
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Publications (5)
SPIE Journal Paper | 21 January 2014 Open Access
Stress assessment for device performance in three-dimensional IC: linked package-scale/die-scale/feature-scale simulation flow
Armen Kteyan, Gevorg Gevorgyan, Henrik Hovsepyan, Jun-Ho Choy, Valeriy Sukharev
JM3, Vol. 13, Issue 01, 011203, (January 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011203
KEYWORDS: Silicon, Transistors, 3D modeling, Calibration, Finite element methods, Instrument modeling, Composites, Back end of line, Metals, Device simulation
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SPIE Journal Paper | 1 January 2010
Errata: Design-specific variation in pattern transver by via/contact etch process: full-chip analysis
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Jun-Ho Choy, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Levon Manukyan, Nikolay Khachatryan, Hasmik Lazaryan, Tetsuya Kamigaki
JM3, Vol. 9, Issue 01, 019801, (January 2010) https://doi.org/10.1117/12.10.1117/1.3314279
SPIE Journal Paper | 1 October 2009
Design-specific variation in pattern transfer by via/contact etch process: full-chip analysis
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Levon Manukyan, Nikolay Khachatryan, Jun-Ho Choy, Hasmik Lazaryan, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Tetsuya Kamigaki
JM3, Vol. 8, Issue 04, 043007, (October 2009) https://doi.org/10.1117/12.10.1117/1.3268422
KEYWORDS: Etching, Polymers, Fluorine, Ions, Plasma, Chemical species, Semiconducting wafers, Oxygen, Carbon, Silicon
Proceedings Article | 13 March 2009 Paper
Design specific variation in pattern transfer by via/contact etch process: full-chip analysis
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Levon Manukyan, Nikolay Khachatryan, Jun-Ho Choy, Hasmik Lazaryan, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Tetsuya Kamigaki
Proceedings Volume 7275, 72750H (2009) https://doi.org/10.1117/12.813882
KEYWORDS: Etching, Polymers, Ions, Plasma, Silica, Chemical species, Calibration, Oxygen, Semiconducting wafers, Plasma etching
Proceedings Article | 1 September 1999 Paper
Integrated simulation of the plasma-assisted gate oxide nitridation
Valeriy Sukharev, Sheldon Aronowitz, Vladimir Zubkov, Helmut Puchner, John Haywood, James Kimball
Proceedings Volume 3881, (1999) https://doi.org/10.1117/12.360558
KEYWORDS: Nitrogen, Chemical species, Monte Carlo methods, Ions, Oxides, Plasma, Semiconducting wafers, Systems modeling, Silica, Boron
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