Ms. Vivien Wang Profile

Vivien Wang

System Engineer at ASML Netherlands BV

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Author

Publications (8)

Proceedings Article | 10 April 2013 Paper

CD optimization methodology for extending optical lithography

C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

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SPIE Journal Paper | 1 January 2011

New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control

Kaustuve Bhattacharyya, Noelle Wright, Maurits van der Schaar, Arie den Boef, Paul Hinnen, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Cathy Wang, Chih-Ming Ke, Jacky Huang, Willie Wang

JM3, Vol. 10, Issue 1, 013013, (January 2011) https://doi.org/10.1117/12.10.1117/1.3532076

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Critical dimension metrology, Birefringence, Distance measurement, Process control, Lithography, Scanning electron microscopy

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Proceedings Article | 2 April 2010 Paper

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

C. Ke, Victor Shih, Jacky Huang, L. Chen, Willie Wang, G. Huang, W. Yang, Sophia Wang, C. Liang, H. Liu, H. Lee, L. Terng, T. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Marc Noot, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Gavin Liu, Wei-Shun Tzeng, Jim Chen, Andreas Fuchs, Omer Adam, Cathy Wang

Proceedings Volume 7638, 76383P (2010) https://doi.org/10.1117/12.853318

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Back end of line, Lithography, 3D metrology, Finite element methods, Scatterometry, Critical dimension metrology

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Proceedings Article | 11 December 2009 Paper

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Victor Shih, Jacky Huang, Willie Wang, G. T. Huang, H. L. Chung, Alan Ho, W. T. Yang, Sophia Wang, Chih-Ming Ke, L. J. Chen, C. R. Liang, H. H. Liu, H. J. Lee, L. G. Terng, T. S. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Dennis Chang, Cathy Wang, Andreas Fuchs, Omer Adam, Karel van der Mast

Proceedings Volume 7520, 75201A (2009) https://doi.org/10.1117/12.837353

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Lithography, Back end of line, Metals, Scatterometry, Front end of line, Signal to noise ratio

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Proceedings Article | 24 March 2009 Paper

A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy

Chih-Ming Ke, Jimmy Hu, Willie Wang, Jacky Huang, H. Chung, C. R. Liang, Victor Shih, H. H. Liu, H. J. Lee, John Lin, Y. Fan, Tony Yen, Noelle Wright, Ruben Alvarez Sanchez, Wim Coene, Marc Noot, Kiwi Yuan, Vivien Wang, Kaustuve Bhattacharyya, Karel van der Mast

Proceedings Volume 7272, 72723R (2009) https://doi.org/10.1117/12.814909

KEYWORDS: Anisotropy, Semiconducting wafers, Scatterometry, Finite element methods, Critical dimension metrology, Birefringence, Absorption, Refractive index, Carbon, Lithography

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Proceedings Article | 23 March 2009 Paper

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Chih-Ming Ke, Jimmy Hu, Willie Wang, Jacky Huang, H. Chung, C. Liang, Victor Shih, H. Liu, H. Lee, John Lin, Y. Fan, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Kiwi Yuan, Vivien Wang, Cathy Wang, Spencer Lin, Mir Shahrjerdy, Andreas Fuchs, Karel van der Mast

Proceedings Volume 7272, 72720A (2009) https://doi.org/10.1117/12.814860

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconducting wafers, Critical dimension metrology, Lithography, Finite element methods, Photomasks, Scanners, Double patterning technology

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Proceedings Article | 1 December 2008 Paper

A comprehensive look at a new metrology technique to support the needs of lithography performance in near future

Jimmy Hu, Chih-Ming Ke, Willie Wang, Jacky Huang, H. L. Chung, C. R. Liang, Victor Shih, H. Liu, H. J. Lee, L. G. Terng, Y. D. Fan, Maurits van der Schaar, Kiwi Yuan, Vivien Wang, Cathy Wang, Mir Shahrjerdy, Andreas Fuchs, Kaustuve Bhattacharyya, Karel van der Mast

Proceedings Volume 7140, 71400N (2008) https://doi.org/10.1117/12.807998

KEYWORDS: Overlay metrology, Metrology, Lithography, Semiconducting wafers, Scatterometry, Photomasks, Feedback control, Optical lithography, Scanners

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Proceedings Article | 24 May 2004 Paper

Overlay advanced process control for foundry application

Xudong Wan, Andy Zhou, Fjord Zhang, Jerry Li, Xiaolan Gu, Evert Mos, Aernout Kisteman, Vivien Wang, Ron Schuurhuis

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.547586

KEYWORDS: Overlay metrology, Process control, Data modeling, Semiconducting wafers, Control systems, Metals, Computer simulations, Databases, Manufacturing, Phase modulation

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Showing 5 of 8 publications

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