Here we present a side-by-side comparison of LIDT of dispersive mirror at a central wavelength of 1030 nm produced via MF magnetron- and RF magnetron- sputtering deposition methods. We have use different layer materials like Ta2O5, HfO2, SiO2. All dispersive mirror provides -200 fs2 in wavelength range 930-1120 nm. The dispersive mirror with Ta2O5/SiO2 has LIDT about 0.12J/cm2. Alternating of HfO2/SiO2 has allowed us to improve LIDT up to 0.2 J/cm2 at 1030 nm, 190fs, 1kHz, in vacuum.
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