Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers

Susan D. Allen

doi:10.1117/12.933787

15 September 1982 Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers

Susan D. Allen

Proceedings Volume 0346, Thin Film Technologies and Special Applications; (1982) https://doi.org/10.1117/12.933787
Event: 1982 Technical Symposium East, 1982, Arlington, United States

Abstract

Laser chemical vapor deposition (LCVD) uses a focused laser beam to locally heat the substrate and drive the CVD reaction. LCVD, therefore, shares the advantages of other laser processing techniques including spatial resolution and control and rapid heating and cooling rates. Characteristics of several types of LCVD films and experiments in optical monitoring of LCVD rates using both pulsed and cw laser are presented.

Citation Download Citation

Susan D. Allen "Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers", Proc. SPIE 0346, Thin Film Technologies and Special Applications, (15 September 1982); https://doi.org/10.1117/12.933787

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