Monitoring Of Optical Thin Films During Deposition

E. Pelletier

doi:10.1117/12.935505

28 November 1983 Monitoring Of Optical Thin Films During Deposition

E. Pelletier

Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935505
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

By direct measurement of the evolution of the optical properties of a dielectric multilayer during its deposition we have access in real time to data on the thickness, the index and the structure of each individual layer. We describe such techniques which have been put into operation in Marseille to tackle the specific problem of monitoring the deposition of optical coatings on surfaces. We analyse the causes of the performance limitations of these monitoring methods.

Citation Download Citation

E. Pelletier "Monitoring Of Optical Thin Films During Deposition", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935505

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