Chairman's Pre-Conference Overview. Lens Specifications And Distortions

Harry L. Stover

doi:10.1117/12.967028

1 January 1987 Chairman's Pre-Conference Overview. Lens Specifications And Distortions

Harry L. Stover

Proceedings Volume 0772, Optical Microlithography VI; (1987) https://doi.org/10.1117/12.967028
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

As high-volume chip production presses into submicron design rules, parasitic error sources in imaging and overlay may be reduced still another factor of two. Variable magnification, and magnification and focus corrections to compensate for barometric pressure changes, for example, illustrate how some imaging/overlay error sources can be dramatically reduced. Another error source in imaging/overlay now receiving considerable attention is lens distortion; lens distortion on the order of 0.2 micron can be a substantial fraction of the error budget for overlay between matched wafer steppers in production of chips with submicron design rules.

Citation Download Citation

Harry L. Stover "Chairman's Pre-Conference Overview. Lens Specifications And Distortions", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967028

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