Electron Beam Testing And Its Applications To VLSI Technology

S. V. Pabbisetty; Kumar Gavisetty; Steve Vaughan; Kendall Scott Wills

doi:10.1117/12.940971

2 February 1988 Electron Beam Testing And Its Applications To VLSI Technology

S. V. Pabbisetty, Kumar Gavisetty, Steve Vaughan, Kendall Scott Wills

Proceedings Volume 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits; (1988) https://doi.org/10.1117/12.940971
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States

Abstract

With the recent advances in instrumentation, automation and spectrometer design, the Electron Beam Tester is fast becoming a standard tool for design verification and failure analysis of Very Large Scale Integrated Circuit (VLSI) technology products. This paper presents a brief overview of the principles of operation and a discussion of the different testing modes. The application of voltage contrast to VLSI technology is illustrated with a few typical examples taken from failure analysis and design verification stages of memory and microprocessor products. Present limitations and future trends of Electron Beam Testing are discussed.

Citation Download Citation

S. V. Pabbisetty, Kumar Gavisetty, Steve Vaughan, and Kendall Scott Wills "Electron Beam Testing And Its Applications To VLSI Technology", Proc. SPIE 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits, (2 February 1988); https://doi.org/10.1117/12.940971

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