Paper
2 February 1988 Wideband Probing Techniques For Planar Devices: A Review
Eric w. Strid
Author Affiliations +
Proceedings Volume 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits; (1988) https://doi.org/10.1117/12.940939
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States
Abstract
Abstract: A review of high-frequency wafer-probing techniques which use contact to the device under test is given. 50-ohm probes have recently been developed for frequencies up to 50 GHz. On-wafer impedance standards and calibration accuracies have also improved. Probes for high-speed MSI circuits require low-impedance power-supply connections. Probes for non-intrusive measurement of internal IC nodes are also reviewed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric w. Strid "Wideband Probing Techniques For Planar Devices: A Review", Proc. SPIE 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits, (2 February 1988); https://doi.org/10.1117/12.940939
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Semiconducting wafers

Calibration

Field effect transistors

Inductance

Integrated circuits

Semiconductors

Capacitance

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