Modern Optical Coating Technologies For Low-Loss Dielectric Films

H. K . Pulker

doi:10.1117/12.968912

16 January 1988 Modern Optical Coating Technologies For Low-Loss Dielectric Films

H. K . Pulker

Proceedings Volume 0952, Laser Technologies in Industry; (1988) https://doi.org/10.1117/12.968912
Event: Laser Technologies in Industry, 1988, Porto, Portugal

Abstract

Highest quality dielectric films are required today for various optical applications. Many inorganic compounds which were difficult to deposit by conventional tech-niques in form of well adherent, dense, hard, and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating material atom processes. A survey over such PVD coating technologies and the resulting film properties is given in this paper.

Citation Download Citation

H. K . Pulker "Modern Optical Coating Technologies For Low-Loss Dielectric Films", Proc. SPIE 0952, Laser Technologies in Industry, (16 January 1988); https://doi.org/10.1117/12.968912

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