Innovative patterning method for modifying few-layer MoS2 device geometries

Fernando Jiménez Urbanos; Andrés Black; Ramón Bernardo-Gavito; Manuel R. Osorio; Santiago Casado; Daniel Granados

doi:10.1117/12.2272702

31 August 2017 Innovative patterning method for modifying few-layer MoS2 device geometries

Fernando Jiménez Urbanos, Andrés Black, Ramón Bernardo-Gavito, Manuel R. Osorio, Santiago Casado, Daniel Granados

Proceedings Volume 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV; 103540G (2017) https://doi.org/10.1117/12.2272702
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States

Abstract

When mechanically exfoliated two-dimensional (2D) materials are used for device applications, their properties strongly depend on the geometry and number of layers present in the flake. In general, these properties cannot be modified once a device has been fabricated out of an exfoliated flake. In this work we present a novel nano-patterning method for 2D material based devices, Pulsed eBeam Gas Assisted Patterning (PEBGAP), that allows us to fine tune their geometry once the device fabrication steps have been completed.

Citation Download Citation

Fernando Jiménez Urbanos, Andrés Black, Ramón Bernardo-Gavito, Manuel R. Osorio, Santiago Casado, and Daniel Granados "Innovative patterning method for modifying few-layer MoS2 device geometries", Proc. SPIE 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV, 103540G (31 August 2017); https://doi.org/10.1117/12.2272702

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