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While radial velocity and transit techniques are efficient to probe exoplanets with short orbits, the study of long-orbit planets requires direct imaging and coronagraphic techniques. However, the coronagraph must deal with planets that are 104 to 1010 fainter than their hosting star at a fraction of arcsecond, requiring efficient coronagraphs at short angular separation. Phase masks proved to be a good solution in monochromatic or limited spectral bandwidth but expansion to broadband requires complex phase achromatization. Solutions use photonic crystals, subwavelength grating or liquid crystal polymers but their manufacturing remains complex. An easier solution is to use photolithography and reactive ion etching and to optimize the azimuthal phase distribution like achieved in the six-level phase mask (SLPM) coronagraph (Hou et al. 2014). We present here the laboratory results of two SLPM coronagraphs enabling high-contrast imaging in wide-band. The SLPM is split in six sectors with three different depths producing three levels of optical path difference and yielding to uniform phase shifts of 0, π or 2π at the specified wavelength. Using six sectors instead of four sectors enables to mitigate the chromatic effects of the SLPM compared to the FQPM (Four-Quadrant Phase Mask) while keeping the manufacturing easy. Following theoretical developments achieved by University of Shanghai and based on our previous experience to fabricate FQPM components, we have manufactured SLPM components by reactive ion etching at Paris Observatory and we have tested it onto the THD2 facility at LESIA. The THD2 bench was built to study and compare high-contrast imaging techniques in the context of exoplanet imaging. The bench allows reducing the starlight below a 10−8 contrast level in visible/near-infrared. In this paper, we show that the SLPM is easy to fabricate at low cost and is easy to implement with a unique focal plane mask and no need of pupil apodization. Detection of a planet can be achieved at small inner working angle down to 1 λ/D. The on-axis attenuation of the best SLPM component reaches 2 × 10−5 at λ = 800 nm and is better than 10−4 in intensity over a 10% spectral bandwidth. Along the diagonal transition, we show that the off-axis transmission is attenuated by less than 3% over a 10% bandwidth and will need to be calibrated. Any etching imperfections can affect the SLPM performance, by lowering the on-axis attenuation and by changing the optimal wavelength. Despite few nanometers of uncertainty for etching the depths, we show that this first component can provide a high-contrast attenuation in laboratory
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