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18 September 2018 Ptychography simulations for precisely measuring wavefront profiles in soft x-ray focusing system based on ellipsoidal mirror
Yoko Takeo, Hiroto Motoyama, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, Hidekazu Mimura
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Proceedings Volume 10761, Adaptive X-Ray Optics V; 107610F (2018) https://doi.org/10.1117/12.2320961
Event: SPIE Optical Engineering + Applications, 2018, San Diego, California, United States
Abstract
In synchrotron radiation facilities, soft X-ray nanofocusing with mirrors remains a hurdle due to difficulties in mirror fabrication. We have been researching the use of ellipsoidal mirrors for soft X-ray nanofocusing. Information on the wavefront errors of focused beams is helpful for improving the focusing system. This study presents ptychographic wavefront measurements for a nanofocusing system with an ellipsoidal mirror. We developed a ptychography program and performed several simulations at 300 eV to investigate the theoretical accuracy of the wavefront measurements. The simulation results indicate that wavefront measurements with high accuracy are possible.
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Yoko Takeo, Hiroto Motoyama, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, and Hidekazu Mimura "Ptychography simulations for precisely measuring wavefront profiles in soft x-ray focusing system based on ellipsoidal mirror", Proc. SPIE 10761, Adaptive X-Ray Optics V, 107610F (18 September 2018); https://doi.org/10.1117/12.2320961
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KEYWORDS
Mirrors
X-rays
Wavefronts
X-ray imaging
Optical simulations
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