Upgrade plan of cERL for the POC as a first stage of the development on EUV-FEL high power light source (Conference Presentation)

Hiroshi Kawata; Norio Nakamura; Ryukou Kato

doi:10.1117/12.2501649

12 October 2018 Upgrade plan of cERL for the POC as a first stage of the development on EUV-FEL high power light source (Conference Presentation)

Hiroshi Kawata, Norio Nakamura, Ryukou Kato

Author Affiliations +

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 1080908 (2018) https://doi.org/10.1117/12.2501649
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

It is important to develop the high power EUV light source up to 1 kW to realize the 3nm node to reduce stochastic variation and achieve a higher through put. To this end, we have proposed an energy recovery linac (ERL)-based free electron laser (FEL) ,which will produce more than 10 kW EUV light to provide the light into several scanners. We studied the feasibilities to reduce the size of the accelerator system itself, and the part of them was presented at the previous symposium last year. And we also gave an idea to develop the POC of the ERL-FEL by using compact ERL (cERL) as a first stage of the EUV-FEL. In this paper, we present the upgrade plan of cERL for the POC. The technologies to be clarified are both of to realize the SASE-FEL based on the ERL and to achieve short electron bunch around 100fs for EUV-FEL light generation. The former is that the energy of the electron beams after the FEL generation can be recovered with the ERL accelerator systems with the high repetition rate such as more than 100MHz. The POC will be completed at the wavelength of near infrared, because of the size limitation of the cERL. The latter will be also realized at the cERL by the bunch compression scheme using a combination of electron beams with a momentum chirp and magnet assemblies with a non-zero longitudinal dispersion. The design values of the upgrade are as follows; the energy of the recirculation electron is 80 MeV, energy of the injection electron is 5 MeV, wavelength of the FEL is 1.35 micron, electron beam current is 10mA, bunch charge is 60 pC/bunch, repetition rate is 162.5 MHz. We have already studied the electron trajectory by using simulation, and checked the feasibilities. We will give detailed studies on the POC.

Conference Presentation

Citation Download Citation

Hiroshi Kawata, Norio Nakamura, and Ryukou Kato "Upgrade plan of cERL for the POC as a first stage of the development on EUV-FEL high power light source (Conference Presentation)", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 1080908 (12 October 2018); https://doi.org/10.1117/12.2501649

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
PRESENTATION

WATCH
PRESENTATION SAVE TO MY LIBRARY

GET CITATION

KEYWORDS

Light sources

Free electron lasers

Electron beams

3D scanning

Extreme ultraviolet

Extreme ultraviolet lithography

Laser scanners

Show All Keywords

Keywords/Phrases

Search In:

Publication Years