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Key components for the EUV mask infrastructure include pattern inspection, which are crucial for the introduction of EUV lithography into HVM. The use of pellicles further aggravates the need for actinic light sources. EUV light sources with a high availability and brightness are required to increase the throughput for pattern inspection systems to HVM requirements. In addition, the future node sizes results in the demand for a much higher brightness actinic light sources, enabling the required throughput and minimize the cost of ownership.
Adlyte has been developing a droplet based laser produced plasma (LPP) light over the last decade, specifically focused on the needs of actinic mask inspection for AIMS, Blank and Pattern Tools. Here, latest technical improvements in the EUV brightness and stability of the LPP light source will be presented. Having demonstrated brightness measurements of over 300 W/mm2 Sr, Adlyte’s light source would fulfill all the technical requirements of actinic pattern mask inspection systems for the present and many future nodes, lowering technology risks for future upgrades. In addition, new advances in droplet generator (DG) technology, including advanced actuation technology will be presented. Long run time testing will demonstrate the operational. Operational DG swap data will also be presented showing minimal downtime to maintain tool uptime. The first bounce EUV collector and its debris control and mitigation will be presented showing affordable source cost-of-ownership (COO). The small footprint of the source as well as state of the art platform damping technology ensures that the light source can be seamlessly integrated into the inspection tool. Roadmap of Adlyte’s light source including HVM manufacturing and productization processes will also be presented and the industrial readiness to support our customers in the field will be outlined.
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