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24 July 2018 Study on the highly intelligent uniformity correction and the application for lithography
Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang
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Proceedings Volume 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018); 108272H (2018) https://doi.org/10.1117/12.2326837
Event: Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 2018, Shanghai, China
Abstract
The uniformity of the illumination field in the scanning direction is an important factor that affects the lithographic overlay accuracy as well as Critical dimension uniformity (CDU). With the improvement of lithography resolution illumination integrated uniformity is also increasing. To improving illumination integrated uniformity, a highly intelligent uniformity correction is introduced, which is used to correct the illumination integrated uniformity by inserting a plurality of independent movable correction plate arrays into the illumination field. In addition, a correction algorithm based on step by step is proposed. The simulation results show that the corrected illumination integrated uniformity is better than 0.3%, which is meeting the requirements of illumination integrated uniformity for 65nm node lithography.
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Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, and Huijie Huang "Study on the highly intelligent uniformity correction and the application for lithography", Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 108272H (24 July 2018); https://doi.org/10.1117/12.2326837
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KEYWORDS
Lithographic illumination
Lithography
Reticles
Diffractive optical elements
Excimer lasers
Optical lithography
Projection systems
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