Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography

B. Martin; A. N. Odell; J. E. Lamb III

doi:10.1117/12.953066

30 January 1989 Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography

B. Martin, A. N. Odell, J. E. Lamb III

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953066
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The application of a new organic anti-reflective coating layer, "ARC-XL" from Brewer Science Inc. is described for high resolution metallisation lithography. The "ARC-XL" is soluble in positive resist developer and is removed in the same process step as the exposed resist so that particular attention is paid to "ARC-XL" bake conditions. The enhanced process latitude to be gained using "ARC-XL" with a high temperature resist is compared to latitude without "ARC-XL" by both electron microscopy and electrical linewidth measurement. "PROLITH" simulations confirm the enhanced process latitude to be gained using "ARC-XL". Further modelling shows resist sidewall profiles with and without "ARC-XL" as a function of stepper focus and exposure.

Citation Download Citation

B. Martin, A. N. Odell, and J. E. Lamb III "Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953066

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