Paper
4 March 2019 Creating integrated optics with ion-sliced lithium niobate combined with patterned silicon or silicon nitride
Ronald M. Reano
Author Affiliations +
Abstract
Design, fabrication, and measurement aspects of integrated optic devices based on ion-sliced lithium niobate combined with patterned silicon or silicon nitride are presented. Combining sub-micrometer thin films of lithium niobate with patterned thin film materials produces a platform for compact integrated optics with second order susceptibility. Hybrid silicon and lithium niobate waveguides are designed at 1550 nm wavelength with micrometer scale mode field diameter. Bend losses are less than 0.1 dB/cm for radii as small as 10 μm. Two hybrid silicon and lithium niobate electro-optic devices are shown, namely, an RF electric-field sensor with an experimentally demonstrated sensitivity of 4.5 V m-1 Hz-1/2 and an electro-optic ring modulator with experimentally demonstrated digital modulation of 4.5 Gb/s at 4.5 dB extinction ratio. A hybrid silicon nitride and lithium niobate device is also presented for quasi-phase matched second harmonic generation. Periodic poling of thin films of x-cut magnesium oxide doped lithium niobate has been achieved with a poling period of 7.5 μm. Chip-scale electro-optics and nonlinear optics are envisioned for classical and quantum communications, sensing, and computing applications.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald M. Reano "Creating integrated optics with ion-sliced lithium niobate combined with patterned silicon or silicon nitride", Proc. SPIE 10922, Smart Photonic and Optoelectronic Integrated Circuits XXI, 109220N (4 March 2019); https://doi.org/10.1117/12.2508071
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Lithium niobate

Thin films

Waveguides

Integrated optics

Back to Top