Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results

Marc A. Verschuuren; Korneel Ridderbeek; Rob Voorkamp

doi:10.1117/12.2514757

26 March 2019 Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results

Marc A. Verschuuren, Korneel Ridderbeek, Rob Voorkamp

Author Affiliations +

Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580D (2019) https://doi.org/10.1117/12.2514757
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

We will introduce SCIL as a full-wafer soft-stamp base nanoimprint technique with the advantages of being able to replicate sub-10nm features and perform micron accurate overlay alignment over 200mm wafers. The combination of PDMS based soft stamps and an inorganic crosslinking imprint resist leads to a very long stamp lifetime and the direct patterning of complex deep sub-micron patterns, such as slanted gratings with an index up to n=2.1. These complex patterns are of high interest for nano-photonic enabled applications such AR/VR and metasurfaces with applications such as “perfect” flat lenses. A new analytical model based on hyper-elastic deformation of silicon rubber nano-patterns was developed and is able to accurately predict pattern stability from sub-micron to less than 20nm patterns.

Conference Presentation

Citation Download Citation

Marc A. Verschuuren, Korneel Ridderbeek, and Rob Voorkamp "Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580D (26 March 2019); https://doi.org/10.1117/12.2514757

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