Insights on reflection: new ideas gained from comparing femtosecond laser development, microscopy, and patterning

B. L. Peterson

doi:10.1117/12.2515158

5 June 2019 Insights on reflection: new ideas gained from comparing femtosecond laser development, microscopy, and patterning

B. L. Peterson

Author Affiliations +

Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580O (2019) https://doi.org/10.1117/12.2515158
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The development of various forms of super-resolution microscopy have paralleled the resolution gains in lithography. From micron limited resolution 30 years ago, to nm resolution today. In biology, the fundamental direction has been to work towards increasing fine structure in the absence of pitch shrink—a fundamentally similar problem to modern lithography. There are a variety of supper-resolution techniques—depletion based, interferometric, harmonic, and multicolor. From a theoretical perspective, both problems are bound by information transfer limits in the system and ultimately by noise.

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B. L. Peterson "Insights on reflection: new ideas gained from comparing femtosecond laser development, microscopy, and patterning", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580O (5 June 2019); https://doi.org/10.1117/12.2515158

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