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26 March 2019 Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)
Charles S. Bevis, Robert Karl Jr., Bin Wang, Peter Johnsen, Michael Tanksalvala, Christina Porter, Yuka Esashi, Henry Kapteyn
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Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109590W (2019) https://doi.org/10.1117/12.2517026
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
My apologies, the technical abstract will be submitted next week.
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Charles S. Bevis, Robert Karl Jr., Bin Wang, Peter Johnsen, Michael Tanksalvala, Christina Porter, Yuka Esashi, and Henry Kapteyn "Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590W (26 March 2019); https://doi.org/10.1117/12.2517026
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KEYWORDS
Extreme ultraviolet
Nanoimaging
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