Status of FLASH2 (Conference Presentation)

Mabel Ruiz-Lopez

doi:10.1117/12.2522966

14 May 2019 Status of FLASH2 (Conference Presentation)

Mabel Ruiz-Lopez

Proceedings Volume 11038, X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V; 110380F (2019) https://doi.org/10.1117/12.2522966
Event: SPIE Optics + Optoelectronics, 2019, Prague, Czech Republic

Abstract

FLASH, the soft X-ray Free Electron Laser in Hamburg provides soft X-ray pulses with high brilliance, short pulse duration and high repetition rate for user experiments. Photon beam parameters can be chosen almost independently for FLASH1 and FLASH2 by the users. The experimental hall Kai Siegbahn is designed to offer up to 6 new beamlines. Currently, three beamlines are in operation, which provide advanced focusing systems and extensive photon diagnostics for user experiments. The variable micro-focus beamline FL24 at FLASH2 offers a Kirkpatrick Baez optical system with bendable mirrors allowing different focus positions for user provided endstations. Measurements realized with a Hartmann wavefront sensor show that the Kirkpatrick Baez optics produce a focus size down to 3 µm, depending operating wavelength and desired focal position. The focus measurements were compared with imprinting techniques and wavefront propagation simulations, obtaining a good agreement between the three methods. Therefore, the wavefront propagation code was proposed for the design of the new monochromator beamline FL23 which may be used for a variety of experimental techniques to study fields such as molecular excitations, magnetism or surface effects. The monochromator is designed to work in the soft X-ray range covering a spectral range from 1-20 nm with a spectral resolution of approximately 2000. The two-grating pulse-length compensating design will provide a pulse duration in the range of 20 to 100 fs.

Conference Presentation

Citation Download Citation

Mabel Ruiz-Lopez "Status of FLASH2 (Conference Presentation)", Proc. SPIE 11038, X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V, 110380F (14 May 2019); https://doi.org/10.1117/12.2522966

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