Paper
30 August 2019 Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance
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Abstract
Reducing the reflection of silicon surface is an effective way to enhance its optical absorption performance in optical and optoelectronic devices. In this paper, the influence mechanism of heat accumulation effect existing in the material substrate on the multi-scale porosity properties of surface structure during femtosecond laser irradiation is investigated. Micro-nano structures will lose their multi-scale porous properties at high-repetition-rate laser irradiation due to excessive agglomeration, nucleation or melting. By rapidly cooling the material substrate, the porosity of surface micro-nano structure are optimized, and the antireflection performance of the material surface is improved obviously. Our study opens a novel and convenient route for preparation of broadband antireflective black silicon surfaces for various applications.
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Tong Chen, Wenjun Wang, Tao Tao, Xuesong Mei, and Aifei Pan "Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance", Proc. SPIE 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV, 111010C (30 August 2019); https://doi.org/10.1117/12.2528299
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KEYWORDS
Silicon

Antireflective coatings

Thermal effects

Femtosecond phenomena

Laser processing

Reflectivity

Laser irradiation

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