2019 Mask makers' survey conducted by the eBeam Initiative

Aki Fujimura; Jan Willis

doi:10.1117/12.2536769

26 September 2019 2019 Mask makers' survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Proceedings Volume 11148, Photomask Technology 2019; 1114803 (2019) https://doi.org/10.1117/12.2536769
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

Captive and merchant mask makers participated in an anonymous survey in the summer of 2019 to capture the profile of the mask industry for the period of July 2018 through June 2019. The eBeam Initiative’s fifth Mask Makers’ Survey in 2019 covers a number of questions related to the profile of the mask industry, from overall number of masks to pattern generation type. The survey respondents – 11 different captive and merchant photomask manufacturers versus those who participated in last year’s survey – reported 599,536 masks this year. Respondents reported that eBeam variable shaped beam (VSB) wrote 30% of the masks they produced this past year with an average VSB mask write time of 8.64 hours. The use of Multi-beam mask writing was affirmed in this year’s survey results. Overall mask yields remain steady at around 94% and EUV mask yield was reported at 74%. The eBeam Initiative also conducts an annual Perceptions Survey of mask industry luminaries which can be found at www.ebeam.org.

Conference Presentation

Citation Download Citation

Aki Fujimura and Jan Willis "2019 Mask makers' survey conducted by the eBeam Initiative", Proc. SPIE 11148, Photomask Technology 2019, 1114803 (26 September 2019); https://doi.org/10.1117/12.2536769

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