Design of CMOS compatible plasmonic color filter for high selectivity

Ayesha Shaukat; Khalid Arif

doi:10.1117/12.2539266

30 December 2019 Design of CMOS compatible plasmonic color filter for high selectivity

Ayesha Shaukat, Khalid Arif

Proceedings Volume 11200, AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019; 112002O (2019) https://doi.org/10.1117/12.2539266
Event: ANZCOP, 2019, Melbourne, Australia

Abstract

In this paper a theoretical study of highly selective plasmonic color filters is demonstrated. The filter design consist of a perforated aluminium film, where nanoholes are arranged in a square lattice. A hybrid substrate is implemented as a dielectric layer which allows high selectivity and minimum spectral cross talk. The impact of the hole periodicity, thicknesses of Si₃N₄ and metallic layer on the device performance is highlighted. The optical resonance transmission properties of the simulated plasmonic color filter including resonance position, transmission efficiency, figure of merit, and spectral bandwidth of resonance peak are also analyzed thoroughly.

Citation Download Citation

Ayesha Shaukat and Khalid Arif "Design of CMOS compatible plasmonic color filter for high selectivity", Proc. SPIE 11200, AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019, 112002O (30 December 2019); https://doi.org/10.1117/12.2539266

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KEYWORDS

Optical filters

Plasmonics

Dielectrics

Aluminum

Silicon

CMOS technology

Extraordinary optical transmission

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