Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Chris Robinson; Cody Murray; Luciana Meli; Anuja De Silva; Dario Goldfarb; Conor Thomas; Madhana Sunder; Mary Ann Zaitz; Guoda Lian; Yiping Yao; Leo Tai; Jay Bunt; Jim Rosa; Malik Ali; Steven Boettcher; Mark Stalter

doi:10.1117/12.2551612

23 March 2020 Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Chris Robinson, Cody Murray, Luciana Meli, Anuja De Silva, Dario Goldfarb, Conor Thomas, Madhana Sunder, Mary Ann Zaitz, Guoda Lian, Yiping Yao, Leo Tai, Jay Bunt, Jim Rosa, Malik Ali, Steven Boettcher, Mark Stalter

Author Affiliations +

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113230P (2020) https://doi.org/10.1117/12.2551612
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

The effective dose delivered by an EUV lithography cluster is composite function of the dose provided by the scanner EUV radiation source and illuminator, the reflectance of the EUV mask, the transmission of the scanner projection optics and the PEB conditions experienced by the EUV sensitive imaging resist. Open frame test wafer exposures and the sub-E0 analysis technique described at SPIE2018 have been adopted to characterize and monitor the impact of the factors above on the effective dose stability and uniformity. Wafer exposure sequences and layouts, and the details of the analysis methodology were customized to study adverse dose factors in each of the areas described above.

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Chris Robinson, Cody Murray, Luciana Meli, Anuja De Silva, Dario Goldfarb, Conor Thomas, Madhana Sunder, Mary Ann Zaitz, Guoda Lian, Yiping Yao, Leo Tai, Jay Bunt, Jim Rosa, Malik Ali, Steven Boettcher, and Mark Stalter "Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230P (23 March 2020); https://doi.org/10.1117/12.2551612

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