Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications

Andrey E. Mironov; Sehyun Park; Thomas Reboli; Jinhong Kim; Dane J. Sievers; Sung-Jin Park; James G. Eden

doi:10.1117/12.2594868

1 August 2021 Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications

Andrey E. Mironov, Sehyun Park, Thomas Reboli, Jinhong Kim, Dane J. Sievers, Sung-Jin Park, James G. Eden

Author Affiliations +

Proceedings Volume 11801, UV and Higher Energy Photonics: From Materials to Applications 2021; 1180103 (2021) https://doi.org/10.1117/12.2594868
Event: SPIE Nanoscience + Engineering, 2021, San Diego, California, United States

Abstract

We report a novel, environmentally-friendly, scalable subtractive process which allows for complex 3D optical, microfluidic and biomedical components and microstructures to be fabricated precisely in a wide variety of polymers. The reported technique is capable of producing submicron structures with <20 nm depth precision in common polymers (PMMA, ABS, etc.) as well as microchannels and 3D surfaces of >20 µm depth in biodegradable polymers. The process is based on a VUV (λ=172 nm) photoablative lithographic technique utilizing flat microplasma lamps and does not require a clean room environment or any chemical processing. The fabricated 3D surface may also be used as a mold for PDMS curing.

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Andrey E. Mironov, Sehyun Park, Thomas Reboli, Jinhong Kim, Dane J. Sievers, Sung-Jin Park, and James G. Eden "Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications", Proc. SPIE 11801, UV and Higher Energy Photonics: From Materials to Applications 2021, 1180103 (1 August 2021); https://doi.org/10.1117/12.2594868

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