Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing

H. Sawaragi; H. Kasahara; R. Mimura; M. Obata; R. Aihara; W. B. Thompson; M. H. Shearer

doi:10.1117/12.963944

15 February 1990 Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing

H. Sawaragi, H. Kasahara, R. Mimura, M. Obata, R. Aihara, W. B. Thompson, M. H. Shearer

Proceedings Volume 1188, Multichamber and In-Situ Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963944
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

Finely focused ion and electron beams have been applied to processes of etching, implantation, and monitoring in multichamber in-situ processing systems. Each application has been evaluated and some remarkable achievements are reported.

Citation Download Citation

H. Sawaragi, H. Kasahara, R. Mimura, M. Obata, R. Aihara, W. B. Thompson, and M. H. Shearer "Recent Applications Of Finely Focused Eb/Ib Tecindlogies For Multichamber And In-Situ Processing", Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); https://doi.org/10.1117/12.963944

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