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9 October 2021 Research on aperture area measurement technique based on optical flux comparison method
Zhiwei Liu, Wende Liu, Weiqiang Zhao, Yongjie Lin, Nan Xu, Yandong Lin
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Proceedings Volume 11899, Optical Metrology and Inspection for Industrial Applications VIII; 118990Z (2021) https://doi.org/10.1117/12.2601281
Event: SPIE/COS Photonics Asia, 2021, Nantong, JS, China
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Abstract
Accurate measurement of the aperture area has always been the focus of optics and optical radiation measurement. The metrology institutes around the world have established absolute aperture area measurement facilities. In this paper, a measuring system of the aperture area based on optical flux comparison method is designed and implemented., which can transfer absolute values efficiently and accurately. The results show that the deviation between the area measured by optical flux comparison method and the area measured by effective area method is about 5×10-4 . The influences of the light source stability, irradiation field uniformity and aperture positioning difference on the measurement results are analyzed emphatically. The uncertainty of the measurement results is also evaluated, the relative expanded uncertainty is 9.9×10- 4 (k=2).
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Zhiwei Liu, Wende Liu, Weiqiang Zhao, Yongjie Lin, Nan Xu, and Yandong Lin "Research on aperture area measurement technique based on optical flux comparison method", Proc. SPIE 11899, Optical Metrology and Inspection for Industrial Applications VIII, 118990Z (9 October 2021); https://doi.org/10.1117/12.2601281
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KEYWORDS
Measurement devices
Optical testing
Metrology
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