Effects of 0.55NA EUV material stack on eBeam metrology performance

Ran Alkoken; Sandip Halder; Hyo Seon Suh; Mor Baram; Gadi Oron; Kasturi Saha; Kevin Houchens; Yarden Melamed

doi:10.1117/12.2658249

30 April 2023 Effects of 0.55NA EUV material stack on eBeam metrology performance

Ran Alkoken, Sandip Halder, Hyo Seon Suh, Mor Baram, Gadi Oron, Kasturi Saha, Kevin Houchens, Yarden Melamed

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 1249616 (2023) https://doi.org/10.1117/12.2658249
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

This conference presentation was prepared for SPIE Advanced Lithography + Patterning, 2023.

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Ran Alkoken, Sandip Halder, Hyo Seon Suh, Mor Baram, Gadi Oron, Kasturi Saha, Kevin Houchens, and Yarden Melamed "Effects of 0.55NA EUV material stack on eBeam metrology performance", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249616 (30 April 2023); https://doi.org/10.1117/12.2658249

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