Practical photomask linewidth measurements

James E. Potzick

doi:10.1117/12.20039

1 June 1990 Practical photomask linewidth measurements

James E. Potzick

Author Affiliations +

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20039
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The measurement cycle for practical accurate photomask linewidth measurements is analyzed as a differential measurement- -the linewidth to be measured is compared to a known linewidth on a standard photomask. The linewidth measuring instrument is thus a comparator. The conditions necessary for a valid measurement are discussed with regard to both the instrument and the comparison process. The principles discussed here apply to many other types of measurement as well.

Citation Download Citation

James E. Potzick "Practical photomask linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20039

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